INTERNATIONAL WORKSHOP ON
X-RAY MIRROR DESIGN,
FABRICATION, AND METROLOGY
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Tuesday 22nd September - Thursday 24th September 2009
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| 08:30 | Opening Speech Kazuto Yamauchi, Osaka University (Japan) |
| Focusing Optics | |
| 8:40 | (Invited) Metrology of Multilayer Laue Lens Structures by means of Scanning Electron Microscope Imaging [Abstract] [Presentation] N. Jahedi1, B. Shi1, R. Conley1,2, J. Qian1, A. Macrander1 1) Advanced Photon Source, Argonne National Laboratory (USA) 2) NSLS-II, Brookhaven National Laboratory (USA) |
| 9:10 | (Invited) Hard X-ray Scanning Microscopy Based on Nanofocusing Refractive X-ray Lenses [Abstract] [Presentation] Christian G. Schroer TU Dresden (Germany) |
| 9:40 | (Invited) Curved graded multilayers for x-ray nano-focusing optics [Abstract] [Presentation] Christian Morawe ESRF (France) |
| 10:10 | X-Ray Nanofocusing with Back Diffracted Bent Crystal [Abstract] [Presentation] Alexey Suvorov SPring-8/JASRI (Japan) |
| 10:30 | Coffee Break |
| Fabrication 1 | |
| 10:50 | Development and application of X-ray mirror in Japan [Abstract] [Presentation] Kazuto Yamauchi Osaka University (Japan) |
| 11:10 | A preferential coating technique for fabricating large, high quality optics [Abstract] [Presentation] S. G. Alcock1 and S. Cockerton2 1) Diamond Light Source Ltd (UK) 2 )Crystal Scientific (UK) Ltd (UK) |
| 11:30 | Ion beam profiling of aspherical X-ray mirrors [Abstract] [Presentation] L.Peverini1, I. Kozhevnikov2, A. Rommeveaux1, P. V. Vaerenbergh1, L. Claustre1, S. Guillet1, J.Y. Massonnat1, E. Ziegler1, J. Susini1 1 )European Synchrotron Radiation Facility (France) 2 ) Institute of Crystallography (Russia) |
| 11:50 | Lunch |
| Metrology 1 | |
| 13:00 | (Invited) Characterization and Calibration of 2nd Generation Slope Measuring Profiler [Abstract] [Presentation] Frank Siewert, Jana Buchheim, Thomas Zeschke Helmholtz Zentrum Berlin für Materialien und Energie, Elektronenspeicherring BESSY-II (Germany) |
| 13:30 | Understanding Slope and Height Measurements [Abstract] [Presentation] Peter Z. Takacs1, Konstantine Kaznatcheev2, Nathalie Bouet2 1) Instrumentation Division, Brookhaven National Laboratory (USA) 2) NSLSII, Brookhaven National Laboratory (USA) |
| 13:50 | Optical metrology at SSRF [Abstract] [Presentation] Luo Hongxin, Wang jie, Xiao tiqiao Shanghai Institute of Applied Physics, Chinese Academy of Sciences (China) |
| 14:10 | Design Idea of the Nanometer and Nanoradian Surface Profiler (NSP) [Abstract] [Presentation] Shinan Qian Brookhaven National Laboratory (USA) |
| 14:30 | Coffee Break |
| Optical System Design 1 | |
| 14:50 | (Invited) Japanese X-ray Free Electron Laser Project [Abstract] [Presentation] Tetsuya Ishikawa RIKEN/SPring-8, XFEL Project Head Office (Japan) |
| 15:20 | (Invited) Development, metrology and analysis of state-of-the-art x-ray mirrors for the LCLS FEL [Abstract] [Presentation] R. Soufli1, T. J. McCarville1, S. L. Baker1, A. Barty1, J. C. Robinson1, J. Ayers1, M. A. Mckernan1, M. J. Pivovaroff1, P. Stefan2, E. M. Gullikson3, D. H. McMahon1, R. M. Bionta1 1) Lawrence Livermore National Laboratory (US) 2) SLAC National Accelerator Laboratory (US) 3) Lawrence Berkeley National Laboratory (US) |
| 15:50 | Wavefront Preserving X-ray Focusing Mirror System for the Linac Coherent Light Source [Abstract] [Presentation] Sébastien Boutet1 and Riccardo Signorato2 1) Linac Coherent Light Source, SLAC National Accelerator Laboratory (USA) 2) BASC (Germany) |
| 16:10 | Coffee Break |
| Optical System Design 2 | |
| 16:30 | (Invited) An hybrid active optical system for wave front preservation and variable focal distance [Abstract] [Presentation] Daniele Cocco, Gianluca Bortoletto, Rudi Sergo, Giovanni Sostero, Ivan Cudin Sincrotrone Trieste ScpA (Italy) |
| 17:00 | (Invited) Optics and metrology needs and development at NSLS-II [Abstract] [Presentation] Qun Schen National Synchrotron Light Source II (NSLS-II) Brookhaven National Laboratory (USA) |
| 17:30 | Optics for new X-ray telescopes: analytical design and optimization [Abstract] Daniele Spiga, Vincenzo Cotroneo INAF/Osservatorio Astronomico di Brera, (ITALY) |
| 17:50 | Laboratory tour |
| 19:00 | Poster Session1(1:00) |
| 20:00 | Banquet |
September 23rd(Wednesday)
| Metrology 2 | |
| 8:30 | (Invited) Metrology in Support of Profile-coated Mirror Fabrication at the APS [Abstract] [Presentation] L. Assoufid1, J. Qian1, C. Liu1, B. Shi1, W. Liu1, C. M. Kewish2, A. M. Khounsary1, A.T. Macrander1 1) Advanced Photon Source, Argonne National Laboratory (USA) 2) PSI, Swiss Light Source (Switzerland) |
| 9:00 | Concept, design and capability analysis of the new Deflectometric Flatness Reference at PTB [Abstract] [Presentation] Michael Schulz, Gerd Ehret, Manuel Stavridis, Clemens Elster Physikalisch-Technische Bundesanstalt, (Germany) |
| 9:20 | Autocollimators for Deflectometry: Current Status and Future Progress [Abstract] [Presentation] Ralf D. Geckeler1, Andreas Just1, Michael Krause1, and Valeriy Yashchuk2 1) Physikalisch-Technische Bundesanstalt Braunschweig und Berlin (PTB) (Germany) 2) Advanced Light Source, Lawrence Berkeley National Laboratory (USA) |
| 9:40 | Coffee Break |
| Fabrication 2 | |
| 10:00 | (Invited) Ultra-precision surface finishing by ion beam and plasma jet techniques - status and outlook [Abstract] [Presentation] T. Arnold, G. Böhm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hänsel, A. Schindler Leibniz-Institute of Surface Modification (Germany) |
| 10:30 | High precision deposition and characterization of single and multilayer X-ray optics [Abstract] [Presentation] R. Dietsch1, St. Braun2, Th. Holz1, M.Kraemer1, K. Mann3, D.Weissbach1 1) AXO Dresden GmbH (Germany) 2) Fraunhofer IWS (Germany) 3) Laser Laboratorium Goettingen e.V. (Germany) |
| 10:50 | Design, fabrication, and performance of KB mirrors produced by the computer-controlled optical surfacing technique [Abstract] [Presentation] A. Khounsary1, G. Ice2, W. Liu1, J. Daniel3, L. Assoufid1, J. Qian1, K. Yamauchi4, H. Mimura4 1) Advanced Photon Source, Argonne National Laboratory(USA) 2) Materials Science and Technology Division, Oak Ridge National Laboratory, (USA) 3) L3-Tinsley, (USA) 4) Osaka University (Japan) |
| 11:10 | Fabrication of conic section mirrors for synchrotron applications [Abstract] [Presentation] Helge Thiess Carl Zeiss (Germany) |
| 11:30 | Lunch |
| 12:30 | Poster Session2 with coffee (1:00) |
| Adaptive Optics | |
| 13:40 |
(Invited) An Overview of Adaptive Optics, and their Metrology, at Diamond Light Source [Abstract] [Presentation] K. J. S. Sawhney, S. G. Alcock, G. Ludbrook and J.P. Sutter Diamond Light Source Ltd (United Kingdom) |
| 14:10 | (Invited) X-ray Digital wavefront development [Abstract] [Presentation] Mourad IDIR1, Jonathan Potier,23,1, Sebastien Fricker2, M. H. Modi4 1) Metrology Beamline, Synchrotron SOLEIL, Gif-sur-Yvette, France, 2) PhaseView, Palaiseau, France 3) Université Paul Sabatier – Toulouse III 4) X-ray Optics Section, Raja Ramanna Centre for Advanced Technology, Indore, India |
| 14:40 | Coffee Break |
| Metrology 3 | |
| 15:00 | (Invited) Binary Pseudo-Random Gratings and Arrays for Calibration of Modulation Transfer Function of Surface Profilometer [Abstract] [Presentation] Samuel K. Barbe1, Erik D. Anderson1 Rossana Cambie1, Wayne R. McKinney1, Peter Z. Takacs1, John C. Stover2, Dmytro L. Voronov Valeriy V. Yashchuk,1 1) Lawrence Berkeley National Laboratory (USA) 2) /Brookhaven National Laboratory (USA) 3) The Scatter Works Inc.(USA) |
| 15:30 | Micro-stitching interferometry at the ESRF [Abstract] [Presentation] Amparo Rommeveaux, Raymond Barrett ESRF (France) |
| 15:50 | X-ray Optics Figure Metrology : Designing a system from basic principles [Abstract] Michael Bray1, Mourad Idir2, Muriel Thomasset2 1) MBO-Metrology (France) 2) Synchrotron Soleil (France) |
| 16:20 | Closing Speech: Kazuto Yamauchi Osaka University (Japan) |
| 16:30 | Excursion and Dinner |
September 24th(Thursday)
| SPring-8/XFEL, Himeji Castle Tour |
Poster Presentation
| Poster session 1 (September 22nd 19:00-20:00; Odd number) Poster session 2 (September 23rd 12:30-13:30; Even number) |
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| Fabrication | |
| (1) | Evolution of the surface finish of an X-ray mirror exposed to a low-energy ion beam [Abstract] E. Ziegler1, L. Peverini1, N. Vaxelaire1, A. Cordon-Rodriguez1, A. Rommeveaux1, I. Kozhevnikov2, J. Susini1 1) European Synchrotron Radiation Facility (France) 2) Institute of Crystallography, (Russian Federation) |
| (2) | Development of X-ray Free Electron Lasers focusing system with 400mm long
mirror [Abstract] D.Yamakawa, H. Mimura, T. Kimura, S. Matsuyama, Y. Sano and K. Yamauchi Osaka University (Japan) |
| (3) | Development of electroforming for ultraprecise mirror fabrication [Abstract]
H. Ishikura, H. Mimura, S. Matsuyama, Y. Sano, K. Yamauchi Osaka University (Japan) |
| (4) | Fabrication of Non-damage Johansson-Type Doubly-Curved-Crystal Spectrometer
Substrate by Numerically Controlled Local Wet Etching [Abstract] K. Ueda1, M. Hosoda1, M. Nagano1, N. Zettsu1, S. Maeo2, S. Shimada2, T. Utaka3, K. Taniguchi3 and K. Yamamura1 1) Osaka University (Japan) 2) Osaka Electro-Communication University (Japan) 3) Institute of X-ray Technologies Co., Ltd. (Japan) |
| (5) | High-reflectivity (m=4) elliptical neutron focusing supermirror by numerically
controlled local wet etching with ion beam sputter deposition [Abstract] M. Nagano1, F. Yamaga, Y. Yamamoto, N. Zettsu1, D. Yamazaki2, R. Maruyama2, K. Soyama2 and K. Yamamura1 1) Osaka University (Japan) 2) J-PARC Center, Japan Atomic Energy Agency (Japan) |
| Metrology | |
| (6) | In situ metrology for the optimization of bent crystals used in hard-X-rays
monochromators. Comparison between measurement and simulation [Abstract] T. Moreno1, B. Capitanio1, M. Thomasset1, M. Idir 1and S. Bucourt2. 1) Synchrotron SOLEIL(France) 2) Imagine Optics(France) |
| (7) | MSI (Microstitching Interferometry) and RADSI (Relative Angle Determinable
Stitching Interferometry) at SPring-8: Interferometric surface profilers for
x-ray mirrors with large numerical aperture [Abstract] H. Yumoto1, T. Miura1, H. Mimura2, T. Kimura2, H. Ohashi1,3, S. Goto1,3, T. Ishikawa3, and K. Yamauchi2 1) JASRI/SPring-8 (Japan) 2) Osaka University (Japan) 3) RIKEN/SPring-8 (Japan) |
| (8) | A LTP stitching procedure with compensation of instrument errors: comparison
of Soleil and ESRF results on a strongly curved ellipticalmirror [Abstract] F. Polack1, M. Thomasset1, S. Brochet1, and A. Rommeveaux2 1) Synchrotron Soleil (France) 2) ESRF (France) |
| (9) | Stitching-angle measurable microscope-interferometer: surface-figure metrology
tool for hard x-ray nanofocusing mirrors with large curvature [Abstract]
H. Yumoto1, H. Mimura2, S. Handa2, T. Kimura2, S. Matsuyama2, Y. Sano2, H. Ohashi1,3, T. Ishikawa3, and K. Yamauchi2 1) JASRI/SPring-8 (Japan) 2) Osaka University (Japan) 3) RIKEN/SPring-8 (Japan) |
| (10) | Lateral shearing method for improving the accuracy of a Fizeau interferometer. [Abstract] J. Nicolas1, J. Vidal1 and J. Campos2 1) ALBA Light Source (Spain) 2) Departament de Física, Universitat Autònoma de Barcelona (Spain) |
| (11) | Comparison of the surface figure measurement of the profile–coated KB mirror
with stitching and PMI Fizeau interferometers [Abstract]
J. Qian, L. Assoufid, C. Liu, B. Shi and A. T. Macrander X-ray Science Division, Argonne National Laboratory(USA) |
| (12) | Self-Calibration: A promising method for improving stitching metrology [Abstract] L. Assoufid1, M. Bray2 , J. Qian1, A. T. Macrander1 1) Advanced Photon Source, Argonne National Laboratory (USA) 2) MBO-Metrology (France) |
| (13) | Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler [Abstract] V. V. Yashchuk1, S. Barber1, E. E. Domning1, J. L. Kirschman1, G. Y. Morrison1, Brian V. Smith1, F. Siewert2, T. Zeschke2, R. Geckeler3, A. Just3 1) Lawrence Berkeley National Laboratory (USA) 2) Helmholtz Zentrum Berlin für Materialien und Energie, Elektronenspeicherring BESSY-II (Germany) 3) Physikalische-Technische Bundesanstalt (PTB) (Germany) |
| (14) | The Diamond-NOM: a non-contact profiler capable of characterizing optical
figure error to sub-nanometre precision [Abstract] S. G. Alcock1, K. J. S. Sawhney1, S. Scott1, U. Pedersen1, R. Walton1, F. Siewert2, T. Zeschke2, F. Senf2, T. Noll2, and H. Lammert2 1) Diamond Light Source Ltd (UK) 2) Helmholtz Zentrum Berlin / BESSY-II (Germany) |
| (15) | Development of Stitching Interferometric System for Large-Size X-Ray Mirror [Abstract] T. Kimura1, H. Ohashi2, H. Mimura1, H. Yumoto2, D. Yamakawa1, T. Tsumura3, H. Okada3, T. Masunaga3, Y. Senba2, T. Goto2, T. Ishikawa2,4 and K. Yamauchi1 1) Osaka University (Japan) 2) SPring-8/ JASRI (Japan) 3) JTEC Corporation (Japan) 4) SPring-8/RIKEN (Japan) |
| (16) | Spherical Concave Mirror Measurement by Phase-Shifting Point Diffraction
Interferometer with Two Optical Fibers [Abstract]
T. Matsuura, K. Udaka, Y. Oshikane, H. Inoue, M. Nakano, K. Yamauchi and T. Kataoka Osaka University(Japan) |
| (17) | Upgrade of long trace profiler (LTP) for high precision x-ray mirrors at
SPring-8 [Abstract] Y. Senba1, H. Kishimoto1, H. Ohashi1,2, H. Yumoto1, S. Goto1,2 and T. Ishikawa1,2 1) JASRI/SPring-8 (Japan) 2) RIKEN/SPring-8 (Japan) |
| (18) | A new concept of ultra-precision surface profiler utilizing surface normal
vector measurements [Abstract] Y. Higashi1, T. Ueno2, J. Uchikoshi2, T. Kume1, K. Enami1, K. Uchimura3, K. Tanaka3 and K. Endo2 1) KEK, High Energy Accelerator Research Organization(Japan) 2) Osaka University (Japan) 3) Toshiba Machine Co.,Ltd (Japan) |
| (19) | Measurement of parallelism error of Double Crystal Monochromator by pencil
beam interferometer [Abstract]
Jun Lim, Seungyu Rah Pohang Accelerator Laboratory, POSTECH (Korea) |
| Focusing Optics | |
| (20) | Recording of interference fringe nano-patterns of hard-x-ray focusing beam [Abstract] H. Yumoto1, H. Mimura2, S. Handa2, T. Kimura2, S. Matsuyama2, Y. Sano2, M. Yabashi3, Y. Nishino3, K. Tamasaku3, H. Ohashi1,3, T. Ishikawa3, and K. Yamauchi2 1) JASRI/SPring-8 (Japan) 2) Osaka University (Japan) 3) RIKEN/SPring-8 (Japan) |
| (21) | Performance of X-ray Focusing Mirror Dedicated to High-pressure
X-ray Spectroscopy at BL39XU of SPring-8 [Abstract]
N. Kawamura1, H. Yumoto1, M. Suzuki1, M. Mizumaki1 and H. Ohashi1 JASRI/SPring-8 (Japan) |
| (22) | Development of Advanced Kirkpatrick-Baez System for Hard X-ray Nano-Imaging [Abstract]
S. Matsuyama1, M. Fujii1 T. Wakioka1, H. Mimura1, T. Kimura1, S. Handa1, Y. Sano1,M. Yabashi2, Y. Nishino2, K. Tamasaku2, T. Ishikawa2 and K. Yamauchi1 1) Osaka University (Japan) 2) SPring-8/RIKEN (Japan) |
| (23) | A Method for High-Precision Determination of the Wavefields of X-ray Nanobeams [Abstract]
S. Handa1, T. Kimura1, H. Mimura1, H. Yumoto2, S. Matsuyama1, Y. Sano1, K. Tamasaku3, Y. Nishino3, M. Yabashi2, T. Ishikawa3, and K. Yamauchi1,4 1) Osaka University (Japan) 2) SPring-8/JASRI (Japan) 3) SPring-8/RIKEN (Japan) 4) Osaka University (Japan) |
| (24) | Ray tracing on challenging multilayer mirror surfaces for extremely low divergence
in collimation and focusing applications [Abstract]
M. G. Honnicke, J. W. Keister, X. Huang and Y. Q. Cai National Synchrotron Light Source II, Brookhaven National Laboratory (USA) |
| (25) | Ray-tracing analysis of hard-X-ray focusing with a depth-graded multilayer
mirror [Abstract]
H. Mimura1, S. Handa1, H. Yokoyama2, T. Kimura1, K. Yamauchi1 Osaka University (Japan) |
| (26) | Optimization Theory of Elliptically Bending K-B Mirror Design [Abstract] Li Ming, Sheng Weifan, Shi Hong, Li Dashi Institute of High Energy Physics, Chinese Academy of Science (China) |
| Adaptive Optics | |
| (27) | A Novel EEM Super-polished, Adaptive Bimorph Optic with Sub-nanometre Dynamical
Figure Control [Abstract]
K. J. S. Sawhney1, S. G. Alcock1, A. J. Dent1, and R. Signorato2 1) Diamond Light Source Ltd (United Kingdom) 2) BASC (Germany) |
| (28) | X-ray active mirror coupled with a Hartmann wavefront analyser [Abstract]
M. Idir1, P. Mercere1, M. H. Modi1, G. Dovillaire1, X. Levecq2, S. Bucourt2, L. Escolano3, P. Sauvageot3 1) Synchrotron SOLEI (France) 2) Imagine Optic (France) 3) ISP System(France) |
| Application | |
| (29) | Three-dimensional x-ray fluorescence imaging with confocal full-field x-ray
microscope [Abstract] A. Takeuchi, Y. Terada, K. Uesugi and Y. Suzuki JASRI/SPring-8 (Japan) |
| (30) | Total-reflection X-ray Optics and Multi-stripe Multilayer Optics for Tomography
Beamlines [Abstract] F. Hertlein1, M. Matiaske1, J. Wiesmann1 and M. Störmer2 1) Incoatec GmbH (Germany) 2) GKSS Research Centre (Germany) |
| (31) | Development and application of high-resolution diffraction microscopy using
synchrotron x-ray beam focused by Kirkpatrik-Baez mirrors [Abstract] Y. Takahashi1, Y. Nishino2, R. Tsutsumi1, H. Kubo1, S. Sakaki1, H. Mimura1, S. Matsuyama1, N. Zettsu1, E. Matsubara3, T. Ishikawa2, and K. Yamauchi1 1) Osaka University (Japan) 2) RIKEN SPring-8 Center (Japan) 3) Kyoto University (Japan) |
| (32) | New X-ray microprobe system for trace heavy element analysis using ultraprecise
X-ray mirror optics of long working distance [Abstract] Y. Terada1, H. Yumoto1, A. Takeuchi1, Y. Suzuki1, T. Uruga1 and K. Yamauchi2 1) JSRI, SPring-8 (Japan) 2) Osaka University (Japan) |
| (33) | Surface Shape Measurements of Silicon Photo-etched with N-fluoropyridinium salts by Near-infrared Transmission Interferometry [Abstract] J. Uchikoshi1, N. Ajari1, K. Tsukamoto1, S. Goto1,T. Nagai2, K. Adachi2, K. Arima1 and M. Morita1 1) Osaka University (Japan) 2) Daikin Industries (Japan) |
| (34) | Hard X-ray Optics Technology Development for Astronomy at the Marshall Space Flight Center [Abstract] Mikhail Gubarev1, Brian Ramsey1, Kiranmayee Kilaru2 1) Marshall Space Flight Center/NASA (USA) 2) University at Huntsville (USA) |
| (35) | One-Dimensional Surface Profile Retrieval from Grazing Incidence Images under Coherent X-Ray Illumination [Abstract] A. Suvorov1, H. Ohashi1, S. Goto1, K. Yamauchi2, T. Ishikawa3 1) SPring-8/JASRI (Japan) 2) Osaka University (Japan) 3) SPring-8/RIKEN (Japan) |
